Fast responding, repeatable delivery of process gases with high and ultra-high levels of purity—that’s the performance the GF100 series of metal sealed mass flow controllers and meters provides. Designed for semiconductor, MOCVD and other gas flow control applications, the GF100 series exceeds the semiconductor industry standard for reliability, ensuring repeatable, highly stable performance over time. Standard MultiFloTM technology enables one MFC to support thousands of gas types and range combinations without removing it from the gas line or compromising on accuracy.","The result: increased process flexibility and efficiency combined with the industry’s highest levels of process gas purity to help maximize yields and productivity.","Features","Benefits","Applications

特性

• Long-term zero stability of <±0.5% full scale per year
• 稳定时间：700毫秒-<1秒
• 满标度流速高达300 slpm
• All-metal seal flow path: option for 4µ or 10µ inch Ra surface finish
• Corrosion-resistant Hastelloy® T-Rise sensor improves measurement reproducibility at elevated temperatures
• MultiFloTM gas and range programmability—one device, thousands of gas types and range combinations without removing the MFC from the gas line or compromising accuracy
• 本地显示器
• 可选sds气体输送
• devicenettm, rs-485 l协议和模拟接口
• 高性能元件的可靠性测试达到了半导体行业标准的七倍
• 全金属耐腐蚀流道，表面积减小，体积不受冲刷，确保在清洗步骤中更快干燥
• With MultiFloTM, new process gases and/or ranges can be set in under 60 seconds – no more removing and calibrating MFCs
• 高度可配置的平台，使大多数品牌的金属密封mfcs，包括前celerity, mykrolis, tylan和单位品牌的dropin更换和升级
• GF120 Safe Delivery System (SDS®) is Brooks’ state-of-the-art low pressure drop mass flow controller for the delivery of sub atmospheric safe delivery system (SDS) gases used in Implant and Etch processes
• 方便的用户显示和独立的诊断/维修端口有助于设备的安装、监控和故障排除
• 半导体蚀刻工具
• 薄膜化学气相沉积系统（CVD、MOCVD、PECVD、ALD）
• 物理气相沉积（pvd）系统
• 外延工艺系统
• 建立时间:700ms - <1秒
• DeviceNetTM、RS-485 L协议和模拟接口
• 方便的用户显示和独立的诊断/服务端口辅助设备的安装、监控和故障排除
• 物理气相沉积(pvd)系统
• 外延过程系统

技术参数